Multilayer pillar for reduced stress interconnect and method of making same

ABSTRACT

A multi-layer pillar and method of fabricating the same is provided. The multi-layer pillar is used as an interconnect between a chip and substrate. The pillar has at least one low strength, high ductility deformation region configured to absorb force imposed during chip assembly and thermal excursions.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application is a continuation application of U.S. application Ser. No. 11/870,583, filed on Oct. 11, 2007, the contents of which are incorporated herein by reference in their entirety.

FIELD OF THE INVENTION

The present invention relates generally to a multi-layer pillar and method of fabricating the same and, more particularly, to a multi-layer pillar interconnect and method of fabricating the same.

BACKGROUND OF THE INVENTION

Traditionally, high temperature C4 (Controlled Collapse Chip Connection) bumps have been used to bond a chip to a substrate. Conventionally, the C4 bumps are made from leaded solder, as it has superior properties. For example, the lead is known to mitigate thermal coefficient (TCE) mismatch between the package and the substrate. Accordingly, stresses imposed during the cooling cycle are mitigated by the C4 bumps, thus preventing delaminations or other damage from occurring to the chip or the substrate.

However, lead-free requirements imposed by the European Union onto electronic components are forcing manufacturers to implement new ways to produce chip-to-substrate-joints. For example, manufactures have used solder interconnects consisting of copper as a replacement for leaded solder interconnents. More specifically, another type of lead free chip-to-substrate-connection is copper pillar technology. In such joints, a solder C4 bump is replaced with a copper pillar or copper pillars plated onto a chip's Under Bump Metallization (UBM). Such connection allows plating of long (80-100 um), small diameter (30-60 um) copper pillars. Also, such chip to package connections are favorable since they offer higher connection density, superior electrical conductivity and allows more uniform current distribution and heat dissipating performance, and hence potentially increased reliability.

However, copper has a high Young's modulus and a high thermal expansion. This being the case, copper is not an ideal candidate for mitigating thermal coefficient (TCE) mismatch between the chip and the substrate. Accordingly, stresses imposed during the cooling cycle cannot be effectively mitigated by the copper pillars, thus resulting in fractures or delaminations or other damage to the package.

Accordingly, there exists a need in the art to overcome the deficiencies and limitations described hereinabove.

SUMMARY OF THE INVENTION

In a first aspect of the invention a structure comprises a modulated copper pillar having at least one low strength, high ductility deformation region configured to absorb force imposed during chip assembly and thermal excursions.

In another aspect of the invention, an interconnect pillar comprises an intermediate layer interposed between two copper layers. The intermediate layer has a lower modulus of elasticity than that of the two copper layers and thereby is configured to absorb stress imposed during a cooling cycle of an interconnect process which would otherwise be imparted onto a chip.

In another aspect of the invention, a method of forming a structure comprises forming a first copper layer; interrupting the forming of the first copper layer to form an intermediate layer; and forming a second copper layer on the intermediate layer. The intermediate layer has a modulus of elasticity lower than the first copper layer and the second copper layer.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention is described in the detailed description which follows, in reference to the noted plurality of drawings by way of non-limiting examples of exemplary embodiments of the present invention, in which:

FIG. 1 shows a first implementation of a multi-layer copper pillar in accordance with the invention;

FIG. 2 shows a second implementation of a multi-layer copper pillar in accordance with the invention;

FIG. 3 shows a third implementation of a multi-layer copper pillar in accordance with the invention;

FIG. 4 shows a fourth implementation of a multi-layer copper pillar in accordance with the invention; and

FIG. 5 shows a structure implementing the multi-layer copper pillar in accordance with the invention.

DETAILED DESCRIPTION OF EMBODIMENTS OF THE INVENTION

The present invention relates generally to a multi-layer pillar interconnect and method of fabricating the multi-layer pillar interconnect and, more particularly, to a multi-layer pillar configured and structured to reduce stress at the joint between the pillar and a chip. In embodiments, copper pillar technology is improved by the addition of one or more layers of high ductility and low strength metal as intermediate layers. The metals, in embodiments, have a higher ductility and lower Young's modulus than copper. The addition of one or more layers of metal creates low strength, high ductility “deformation” or stress relieving regions which absorb tensile stresses generated during chip assembly (reflow) processes, e.g., during the cooling cycle of the chip-substrate joining process.

In one mechanism, the intermediate metal layers allow the pillar to tilt and/or slide to compensate for Thermal Coefficient of Expansion (TCE) mismatch between the chip and the substrate (e.g., organic laminate). This may be due to the melting of the material during the heating processes (e.g., peak temperature being about 240° C. to 270° C.). In another mechanism, the intermediate metal layers, being more ductile than copper, can absorb stresses created during the cooling cycle (which would otherwise be imparted onto the chip or copper metallurgy, itself). Thus, by implementing the structures of the invention, stresses normally transmitted to the chip will be absorbed by the intermediate metal layers in the structures of the invention, preventing chip damage and increasing module yield.

FIRST EMBODIMENT OF THE INVENTION

In the embodiment of FIG. 1, a multi-layer pillar in accordance with the invention is generally depicted as reference numeral 10. In embodiments, the multi-layer pillar 10 is typically between 60 to 80 microns in thickness; although any thickness for a particular application is contemplated by the invention. Accordingly, the invention should not be limited to the exemplary illustration of between 60 to 80 microns in thickness, in any of the embodiments.

The multi-layer pillar 10 includes a barrier and adhesion layer 12. In one embodiment, the barrier and adhesion layer 12 may be Titanium Tungsten (TiW); although, other barrier and adhesion materials are also contemplated by the invention. For example, as should be understood by those of skill in the art, the barrier and adhesion layer 12 can be any material which prevents diffusion of materials between a chip (shown in FIG. 5) and materials of the multi-layer pillar 10 or substrate (shown in FIG. 5).

Still referring to FIG. 1, a seed layer 14 is formed on the barrier and adhesion layer 12. In embodiments, the seed layer 14 is Chromium Copper (Cr/Cu). Alternatively, the seed layer 14 is Copper (Cu). The seed layer 14 may be formed by any conventional chemical or physical vapor deposition process (CVD or PVD). As should be understood by those of skill in the art, the seed layer 14 is used for the formation of the copper layer of the pillar, in subsequent processing steps.

A copper layer 16 a is formed on the seed layer 14 to a certain height, depending on the particular application. In embodiments, the copper 16 a is formed in a high-deposition-rate electroplating bath. At a predetermined time and/or height of the copper column the electroplating of copper is interrupted in order to form a low strength, high ductile layer 18 a (e.g., solder-type disc layer) on the copper layer 16 a. In embodiments, the formation of the copper column can be interrupted when the copper column is about 5 to 30 um. The low strength, high ductile layer 18 a is an intermediate layer of about 5 to 20 microns and more preferably 5 to 10 microns, formed by a deposition process. The deposition process may be provided by an electrolytic bath, in embodiments.

In embodiments, the low strength, high ductile layer 18 a is, for example, Tin (Sn), Bismuth (Bi) or Indium (In), depending on the particular application. The Young's modulus (modulus of elasticity) of Sn is 50, the Young's modulus of Bi is 32 and the Young's modulus of In is 11; whereas, the Young's modulus of Cu is 130. Moreover, the rigidity modulus (i.e., the change of shape produced by a tangential stress) of Sn is 18, the rigidity modulus of Bi 12 and the rigidity modulus of In is 12; whereas the rigidity modulus of Cu is 48.

According to the principles of the invention, as the materials of layer 18 a are less rigid (of lower strength) than copper, once formed, the entire pillar is capable of sliding or tilting to compensate for Thermal Coefficient of Expansion (TCE) mismatch between the chip and the substrate (e.g., organic laminate) during heating processes. This may be due to the melting of the material during the chip-joining processes (e.g., peak temperature being about 240° C. to 270° C.). In another mechanism, as the materials used for the layer 18 a are more ductile than copper, such materials can absorb stresses created during the cooling cycle. That is, the low strength, high ductile layer 18 a forms a low strength, high ductile region which absorbs forces imposed during the chip assembly and thermal excursions of the interconnect process thereby absorbing stresses that would otherwise have been transmitted to the chip or copper metallurgy. Thus, by implementing the structures of the invention, stresses normally imposed on the chip or copper metallurgy will be absorbed by layer 18 a in the structures of the invention, preventing chip damage, delamination of UBM structure and increasing module yield.

In embodiments, an optional nickel barrier layer 20 (at the interface between the low strength, high ductile layer 18 a and the copper layer(s)) can be used to minimize the interaction between high ductile layer 18 a and the copper layer(s). In the case that the layer 18 a is Sn, the reaction product between copper and tin, a material of higher electrical resistivity, is relatively thicker. In the presence of the optional nickel layer, this reaction product, a material of higher electrical resistivity, between layer 18 a and the nickel layer is relatively thinner. In embodiments, the optional nickel barrier layer 20 is approximately 1.0 to 2.0 um in thickness. In further embodiments, the optional nickel barrier layer 20 can be formed on both sides of the low strength, high ductile layer 18 a to prevent a reaction between the layer 18 a (e.g., solder-type disc layer) and the copper.

A copper layer 16 b is formed on the low strength, high ductile layer 18 a (or nickel layer 20) to form the remaining portions of the multi-layer pillar 10. Much like the copper layer 16 a, a high-rate electroplating bath forms the copper layer 16 b. In further embodiments, the tip of the multi-layer pillar 10 can be plated with an optional solder disc 22 to provide a connection to a substrate (FIG. 5) during a reflow process.

SECOND EMBODIMENT OF THE INVENTION

In the embodiment of FIG. 2, the multi-layer pillar is generally depicted as reference numeral 10. As in the embodiment of FIG. 1, the multi-layer pillar 10 is typically between 60 to 80 microns in thickness; although any thickness for a particular application is contemplated by the invention. As discussed below, the embodiment of FIG. 2 includes two or more intermediate layers.

The multi-layer pillar 10 includes a barrier and adhesion layer 12. In one embodiment, the barrier and adhesion layer 12 may be Titanium Tungsten (TiW); although, other barrier and adhesion materials are also contemplated by the invention. Again, the barrier and adhesion layer 12 can be any material which prevents diffusion of materials between a chip (shown in FIG. 5) and materials of the pillar 10 or substrate (shown in FIG. 5).

Still referring to FIG. 2, a seed layer 14 is formed on the barrier and adhesion layer 12. In embodiments, the seed layer 14 is Chromium Copper (Cr/Cu) or Copper (Cu). The seed layer 14 may be formed by any conventional chemical or physical vapor deposition process (CVD or PVD). A copper layer 16 a is formed on the seed layer 14 to a certain height, depending on the particular application. In embodiments, the copper layer 16 a is formed in a high-rate electroplating bath. In embodiments, the formation of the copper layer 16 a can be interrupted when the copper column is about 5 to 30 um.

As discussed above, prior to the formation of the entire pillar 10, the electroplating of copper is interrupted in order to form a low strength, high ductile layer 18 a (e.g., solder-type disc layer) on the copper layer 16 a. In embodiments, the high ductile metal 18 a is an intermediate layer of about 5 to 20 microns and more preferably 5 to 10 microns, formed by a deposition process. The deposition process may be provided by an electrolytic bath, in embodiments. In embodiments, the high ductile metal layer 18 a is, for example, Tin (Sn), Bismuth (Bi) or Indium (In), depending on the particular application.

In embodiments, an optional nickel barrier layer 20 (represented as the interface between the low strength, high ductile layer 18 a and the copper layer(s)) can be used to prevent the interaction between high ductile layer 18 a and the copper layer(s). In the case that layer 18 a is Sn, the reaction product between copper and tin, a material of higher electrical resistivity, is relatively thicker. In presence of the optional nickel layer, this reaction product, a material of higher electrical resistivity, between layer 18 a and the nickel layer is relatively thinner minimize the interaction between high ductile layer 18 a and the copper layer(s). In embodiments, the optional nickel barrier layer is approximately 1.0 to 2.0 um in thickness. In further embodiments, the optional nickel barrier layer 20 can be formed on both sides of the intermediate layer or layers to prevent a reaction between the intermediate layers (e.g., solder-type disc layer) and the copper.

A second copper layer 16 b is formed on the low strength, high ductile layer 18 a (or nickel layer) to form an additional portion of the multi-layer pillar 10. As with the copper layer 16 a, the copper layer 16 b can be formed in a high-rate electroplating bath. The electroplating of copper is interrupted again to form a second low strength, high ductile layer 18 b (e.g., solder-type disc layer) on the copper layer 16 b. In embodiments, the formation of the copper layer 16 b can be interrupted when the copper column is about 10 to 30 um.

In embodiments, the low strength, high ductile layer 18 b is an intermediate layer of about 5 to 20 microns and more preferably 5 to 10 microns, formed by a deposition process. The deposition process may be provided by an electrolytic bath, in embodiments. In embodiments, the low strength, high ductile layer 18 b is, for example, Tin (Sn), Bismuth (Bi) or Indium (In), depending on the particular application.

Again, according to the principles of the invention, as the materials of layers 18 a, 18 b are less rigid (of lower strength) than copper, once formed, the entire pillar is capable of sliding or tilting to compensate for Thermal Coefficient of Expansion (during heating processes) mismatch between the chip and the substrate (e.g., organic laminate). In another mechanism, as the materials used for the layers 18 a, 18 b are more ductile than copper, such materials can absorb stresses created during the cooling cycle. That is, the layers 18 a, 18 b form a low strength, high ductile region which absorb forces imposed during the chip assembly and thermal excursions thereby absorbing stresses that would otherwise have been transmitted to the chip or copper metallurgy. Thus, by implementing the structures of the invention, stresses normally transmitted to the chip or copper metallurgy will be absorbed by the layers 18 a, 18 b in the structures of the invention, thereby preventing delamination of the UBM layers.

A copper layer 16 c is formed on the low strength, high ductile layer 18 b (or nickel layer) to form the remaining portion of the multi-layer pillar 10. As with the copper layers 16 a and 16 b, the copper layer 16 c can be formed in a high-rate electroplating bath. In embodiments, the formation of the copper layer 16 c can be interrupted when the copper column is about 20 to 30 um. Additionally, an optional nickel layer 20 may be formed at the interfaces between the low strength, high ductile layer 18 b and the copper layers 16 b, 16 c to prevent a reaction between the intermediate layer 18 b (e.g., solder-type disc layer) and the copper layers 16 b, 16 c. In an optional embodiment, the tip of the multi-layer pillar 10 can be plated with an optional solder disc 22 to provide a connection to a substrate (FIG. 5) during a reflow process.

In the embodiments of FIGS. 1 and 2, the number, position and thickness of the low strength, high ductile layers can vary according to technology application and space (e.g. chip size, number of C4 type connections, position of C4 connections on the chip, etc.). Additionally, the above materials for the low strength, high ductile layers can vary depending on the technology, noting that the modulus of elasticity should be lower than that of copper. Also, the number of modulated pillars in accordance with the invention deposited onto a single Under Bump Metallization (UBM) may vary depending on the particular application.

THIRD EMBODIMENT OF THE INVENTION

FIG. 3 shows a third embodiment in accordance with the invention. In this embodiment, the multi-layer pillar 10 includes high melting point materials as discussed below. In embodiments, the multi-layer pillar 10 is typically between 60 to 80 microns in thickness; although any thickness for a particular application is contemplated by the invention.

The multi-layer pillar 10 includes a barrier and adhesion layer 12. In one embodiment, the barrier and adhesion layer 12 may be Titanium Tungsten (TiW); although, other barrier and adhesion materials are contemplated by the invention. A seed layer 14 is formed on the barrier and adhesion layer 12. In embodiments, the seed layer 14 is Chromium Copper (Cr/Cu) or Copper (Cu). The seed layer 14 may be formed by any conventional chemical deposition or physical deposition (CVD or PVD) method.

A copper layer 16 a is formed on the seed layer 14 to a certain height, depending on the particular application. In embodiments, the formation of the copper layer 16 a can be interrupted when the copper column is about 5 to 30 um. In embodiments, the copper layer 16 a is formed in a high-rate electroplating bath. The electroplating of copper is interrupted to form a low strength, high ductile layer 18 a on the copper layer 16 a. In embodiments, the low strength, high ductile layer 18 a is an intermediate layer of about 0.2 to 2.0 micron, formed by a deposition process. The deposition process may be provided by an electrolytic bath, in embodiments.

In embodiments, the low strength, high ductile layer 18 a is, for example, Gold (Au), Silver (Ag) or Aluminum (Al), depending on the particular application. The Young's modulus (modulus of elasticity) of Au is 78, the Young's modulus of Ag is 83 and the Young's modulus of Al is 76; whereas, the Young's modulus of Cu is 130. Moreover, the rigidity modulus (i.e., the change of shape produced by a tangential stress) of Au is 27, the rigidity modulus of Ag 30 and the rigidity modulus of Al is 26; whereas the rigidity modulus of Cu is 48.

In the embodiment of FIG. 3, the low strength, high ductile layer 18 a has a higher melting temperature than lead-free solder and, as such, it does not melt during the assembly processing. And, again, according to the principles of the invention, the materials of low strength, high ductile layer 18 a are configured such that the entire pillar is capable of sliding or tilting to compensate for Thermal Coefficient of Expansion (TCE) mismatch between the chip and the substrate (e.g., organic laminate) during the cooling part of the chip joining processes. In another mechanism, the materials used for the low strength, high ductile layer 18 a are more ductile than copper and, as such, are capable of absorbing stresses created during the cooling cycle. That is, the low strength, high ductile layer 18 a can deform during the cooling cycle thereby absorbing stresses that would otherwise have been imposed on the UBM metallurgy. Thus, by implementing the structures of the invention, stresses normally transmitted to the chip or copper metallurgy will be absorbed by the low strength, high ductile layer in the structures of the invention, preventing delamination of UBM layers, chip damage and increasing module yield.

In embodiments, an optional nickel barrier layer 20 can be formed on both sides of the low strength, high ductile layer 18 a to have a reduced reaction product between layer 18 a and prevent a reaction between the layer 18 a and the copper. A copper layer 16 b is formed on the low strength, high ductile layer 18 a (or nickel layer 20) to form the remaining portion of the multi-layer pillar 10. Much like the copper layer 16 a, a high-rate electroplating process forms the copper layer 16 b. In further embodiments, the tip of the multi-layer pillar 10 can be plated with an optional solder disc 22 to provide a connection to a substrate (FIG. 5) during a reflow process.

FOURTH EMBODIMENT OF THE INVENTION

In the embodiment of FIG. 4, the multi-layer pillar 10 includes two (or more) intermediate layers, as discussed below. As in the embodiment of FIGS. 1-3, the multi-layer pillar 10 is typically between 60 to 80 microns in thickness; although any thickness for a particular application is contemplated by the invention.

The multi-layer pillar 10 includes a barrier and adhesion layer 12. In one embodiment, the barrier and adhesion layer 12 may be Titanium Tungsten (TiW); although, other barrier and adhesion materials are also contemplated by the invention. Again, the barrier and adhesion layer 12 can be any material which prevents diffusion of materials between a chip (shown in FIG. 5) and materials of the pillar 10 or substrate (shown in FIG. 5).

Still referring to FIG. 4, a seed layer 14 is formed on the barrier and adhesion layer 12. In embodiments, the seed layer 14 is Chromium Copper (Cr/Cu) or Copper (Cu). The seed layer 14 may be formed by any conventional chemical or physical process (CVD or PVD). A copper layer 16 a is formed on the seed layer 14 to a certain height, depending on the particular application. In embodiments, the copper 16 a is formed in a high-rate electroplating bath.

Again, prior to the formation of the entire multi-layer pillar 10, the electroplating of copper is interrupted in order to form a low strength, high ductile layer 18 a on the copper layer 16 a. In embodiments, the formation of the copper layer 16 a can be interrupted when the copper column is about 5 to 30 um. In embodiments, the low strength, high ductile layer 18 a is, for example, Gold (Au), Silver (Ag) or aluminum (Al), depending on the particular application. In embodiments, the low strength, high ductile layer 18 a is an intermediate layer of about 0.2 to 2.0 micron, formed by a deposition process. The deposition process may be provided in an electrolytic bath, in embodiments.

In embodiments, an optional nickel barrier layer 20 (at the interface between the intermediate layer 18 a and the copper layer(s)) can be formed on both sides of the intermediate layer or layers to prevent a reaction between the intermediate layers and the copper. A second copper layer 16 b is formed on the low strength, high ductile layer 18 a (or nickel layer) to form an additional portion of the multi-layer pillar 10. As with the layer 16 a, the copper layer 16 b can be formed in a high-rate electroplating bath. In embodiments, the formation of the copper layer 16 b can be interrupted when the copper column is about 10 to 30 um.

In embodiments, the electroplating of copper is interrupted to form a second low strength, high ductile layer 18 b on the copper layer 16 b. In embodiments, the second high ductile metal layer 18 b is, for example, Gold (Au), Silver (Ag) or aluminum (Al), depending on the particular application. In embodiments, the second high ductile metal layer 18 b is an intermediate layer of about 0.2 to 2.0 micron, formed by a deposition process. The deposition process may be provided in an electrolytic bath, in embodiments.

A copper layer 16 c is formed on the second high ductile metal layer 18 b (or nickel layer) to form the remaining portion of the multi-layer pillar 10. As with the layers 16 a and 16 b, the copper layer 16 c can be formed in a high-rate-electroplating bath. Additionally, an optional nickel layer may be formed at the interfaces between the intermediate layer 18 b and the copper layers 16 b, 16 c to prevent a reaction between the intermediate layer 18 b and the copper layers 16 b, 16 c. In an optional embodiment, the tip of the multi-layer pillar 10 can be plated with an optional solder disc to provide a connection to a substrate (FIG. 5) during a reflow process.

In the embodiment of FIG. 4, the layers 18 a, 18 b have a higher melting temperature than lead-free solder, and, as such do not melt during assembly processing. Additionally, according to the principles of the invention, the materials of layers 18 a, 18 b permit the entire pillar to slide or tilt to compensate for Thermal Coefficient of Expansion (TCE) mismatch between the chip and the substrate (e.g., organic laminate) during the heating processes. In another mechanism, the layers 18 a, 18 b are more ductile than copper and, as such, are capable of absorbing stresses created during the cooling cycle. That is, the layers 18 a, 18 b can deform during the cooling cycle thereby absorbing stresses that would otherwise have been imposed on the UBM metallurgy. Thus, by implementing the structures of the invention, stresses normally transmitted to the chip or copper metallurgy will be absorbed by layers 18 a, 18 b in the structures of the invention, thereby preventing UBM fatigue and increasing module yield.

In the embodiments of FIGS. 3 and 4, the number, position and thickness of the intermediate layers can vary according to technology application and space (e.g. chip size, number of C4 type connections, position of C4 connections on the chip, etc.). Additionally, the above materials for the intermediate layers can vary depending on the technology, noting that the modulus of elasticity should be lower than that of copper. Also, the number of modulated pillars in accordance with the invention the deposited onto a single UBM may vary depending on the particular application.

STRUCTURE OF THE INVENTION

FIG. 5 shows a packaged structure in accordance with the invention. In particular, FIG. 5 shows the utilization of the multi-layer pillar 10 of FIG. 1 bonded to a substrate 50 and a chip 60. It should be recognized that any of the structures discussed above can be implemented with the substrate 50 and chip 60 shown in FIG. 5.

In the structure of FIG. 5, a via 70 is provided in the substrate. The via 70 includes Cu and materials such as, for example, SnCu solder or SnCuAg solder or NiP and Au or Ag, to name a few materials, which can be used to assist in the bonding of the substrate 50 to the multi-layer pillar 10 during the heating process. That is, the material on the via 70 will flow during the heating process, bonding the substrate 50 to the multi-layer pillar 10 or the solder on the copper pillar (disc 22 in FIG. 5) will flow and provide the bonding.

As should be understood by those of skill in the art, the chip 60 has a lower CTE than that of the organic substrate 50. Thus, during the cooling cycle, the substrate 50 will shrink faster than the chip 50. Compared to a conventional structure, as the multi-layer pillar 10 of the invention includes a deformation zone, the stresses created by the substrate 50 (shrinking faster than chip 60) will be absorbed by the multi-layer pillar 10. This will protect the chip from fracture of layers under the UBM during the connection process and thermal excursions thus increasing overall module yield and reliability.

The methods and structures as described above are used in the fabrication of integrated circuit chips. The resulting integrated circuit chips can be distributed by the fabricator in raw wafer form (that is, as a single wafer that has multiple unpackaged chips), as a bare die, or in a packaged form. In the latter case the chip is mounted in a single chip package (such as a plastic carrier, with the structures of the invention) or in a multichip package (such as a ceramic carrier that has either or both surface interconnections or buried interconnections). In any case the chip is then integrated with other chips, discrete circuit elements, and/or other signal processing devices as part of either (a) an intermediate product, such as a motherboard, or (b) an end product. The end product can be any product that includes integrated circuit chips, ranging from toys and other low-end applications to advanced computer products having a display, a keyboard or other input device, and a central processor.

While the invention has been described in terms of embodiments, those skilled in the art will recognize that the invention can be practiced with modifications and in the spirit and scope of the appended claims. 

What is claimed is:
 1. A method of forming a copper interconnect pillar, the method comprising: forming a first copper layer on at least one other layer; forming a first nickel barrier protective layer on the first copper layer and in direct contact with the first copper layer; forming a substantially planar first intermediate layer on the first nickel barrier protective layer, the first intermediate layer having a first surface in direct contact with the first nickel barrier protective barrier layer, and having a modulus of elasticity lower than the first copper layer; forming a second nickel barrier protective layer on a second surface of the first intermediate layer opposing the first surface of the first intermediate layer and in direct contact with the second surface of the first intermediate layer; and forming a second copper layer on the second nickel barrier protective layer and in direct contact with a surface of the second nickel barrier layer opposing the first intermediate layer, the first intermediate layer having a modulus of elasticity lower than the second copper layer.
 2. The method of claim 1, wherein the first intermediate layer is a single chemical element comprising one of tin, bismuth and indium.
 3. The method of claim 1, wherein the first nickel barrier protective layer is at an interface between the first copper layer and the first intermediate layer, and the second nickel barrier protective layer is at an interface between the first intermediate layer and the second copper layer.
 4. The method of claim 1, further comprising: forming a seed layer comprising one of chromium copper and copper; and forming the first copper layer in direct contact on the seed layer.
 5. The method of claim 1, wherein: the at least one other layer is a seed layer comprising one of chromium copper and copper; the forming the first copper layer comprises electroplating the first copper layer on the seed layer; and the forming the second copper layer comprises using an electroplating bath to form the second copper layer.
 6. The method of claim 1, wherein: the first surface of the first intermediate layer is substantially planar over its entirety; and the second surface of the first intermediate layer is substantially planar over its entirety.
 7. The method of claim 6, wherein the first surface of the first intermediate layer is in direct contact with a surface of the first nickel barrier layer over its entirety.
 8. The method of claim 6, wherein the second surface of the first intermediate layer is in direct contact with a surface of the second nickel barrier layer over its entirety.
 9. The method of claim 1, further comprising: forming a second intermediate layer with nickel barrier protective layers on opposing surfaces thereof and directly on the second copper layer; and forming a third copper layer on the second intermediate layer with the nickel barrier protective layers, each of the first and second intermediate layers having a modulus of elasticity lower than each of the first, second, and third copper layers.
 10. The method of claim 9, wherein one of the nickel barrier protective layers is in direct contact with the second copper layer, and another of the nickel barrier protective layers is in direct contact with the third copper layer.
 11. The method of claim 10, wherein the second intermediate layer is a single chemical element comprising one of tin, bismuth and indium.
 12. A method of bonding a chip to a substrate utilizing at least one multi-layer copper interconnect pillar, comprising: providing a chip having a barrier and adhesion layer; forming a seed layer on the barrier and adhesion layer, the seed layer comprising one of chromium copper and copper; forming a first copper layer directly on and in contact with the seed layer; forming an entirely planar first intermediate layer directly on the first copper layer, the entirely planar first intermediate layer having a modulus of elasticity lower than the first copper layer; forming a second copper layer directly on the entirely planar first intermediate layer, the first intermediate layer having a modulus of elasticity lower than the second copper layer; forming an entirely planar second intermediate layer in contact with the second copper layer; forming a third copper layer in contact with the entirely planar second intermediate layer; and bonding the resulting structure to a substrate.
 13. The method of claim 12, wherein the overall height of the pillar resulting from the method is more than its width.
 14. The method of claim 12, wherein: the forming the first copper layer comprises electroplating the first copper layer on the seed layer; and the forming the second copper layer comprises using an electroplating bath to form the second copper layer.
 15. The method of claim 12, further comprising forming a cap layer on the second copper layer before bonding to the substrate, the cap layer having properties to bond the interconnect pillar to the substrate.
 16. The method of claim 15, wherein the cap layer is solder.
 17. The method of claim 12, further comprising: forming a first barrier protective layer at an interface between the first copper layer and the entirely planar first intermediate layer: and forming a second barrier protective layer at an interface between the entirely planar first intermediate layer and the second copper layer.
 18. The method of claim 17, wherein each of the first and second barrier protective layers is nickel.
 19. A method of bonding a chip to a substrate utilizing at least one multi-layer copper interconnect pillar, comprising: providing a chip having a barrier and adhesion layer; forming a seed layer on the barrier and adhesion layer, the seed layer comprising one of chromium copper and copper; forming a first copper layer on the barrier and adhesion layer; forming an entirely planar first intermediate layer directly on the first copper layer, the entirely planar first intermediate layer having a modulus of elasticity lower than the first copper layer; forming a second copper layer directly on the first intermediate layer, the first intermediate layer having a modulus of elasticity lower than the second copper layer; forming an entirely planar second intermediate layer in contact with the second copper layer; forming a third copper layer in contact with the entirely planar second intermediate layer, and bonding the resulting structure to a substrate, wherein the entirely planar first intermediate layer is a single chemical element comprising one of gold, silver and aluminum. 